LINDE

Three types available can be used for pre- and final polishing depending on graduation.

Technical Data

LINDA A LINDE B LINDE C
Crystal shape hexagonal kubisch hexagonal
Crystal structure Alpha Gamma Alpha
Hardness (Mohs) 9 8 9
Average particle size 0,3 µ 0,05 µ 1,0 µ
pH (in dist. water) 6 - 9 6 - 8 6 - 9

Chemical Structure

Al2O3 Min. 99,98%
K Max. 60 ppm
Na Max. 50 ppm
Si Max. 50 ppm
Fe Max. 15 ppm
Ca Max. 10 ppm
Cu Max. 10 ppm
Mg Max. 10 ppm
Mn Max. 10 ppm

Application

LINDE polish can be used for achieving premium quality for processed parts. It is suitable for processing a wide range of materials:

  • Metals
  • Optic components
  • Ceramics
  • Ferrites
  • Plastics
  • Aluminium

LINDE polish can also be used for processing semiconductor materials like:

  • Memory discs
  • Optic crystals
  • Germanium
  • Silicon

Mixture/ Concentration

LINDE polish can be mixed with tap-water or distilled water as well as advanced lapping oils. For individual use, the optimal concentration should be found by experimental tests, both suspension and pastes.

polishing wheels

For polishing with LINDE products a variable range of polishing wheels can be applied, e. g.

· SYNTEX 65/ NE
· POLYURETHANE
· POLISHING PITCH