Polishing felt POLYCON

Application

Semiconductor
Substrates:
(silicon, gallium
arsenide, GGG,
lithium niobate,
synthetic sapphires)
Photo masks
Glass for
liquid crystals
Storage discs:
(aluminium and
nickel substrates)
Optics
POLYCON 100 X X X
POLYCON 205P X X X X

POLYCON 100

For completing final polishing

Hardness available: A

Dimensions
Max. width: ca. 138 cm in plain and 96 cm in PS
Thickness: 1.35 mm

POLYCON 205P

For the pre- and final polish
POLYCON 205 P is characterized by an extremely uniform surface and an excellent service life. The surface has a structure for optimal suspension distribution. Very resistant material in the alkaline range (pH: 13) at high pressures and temperatures.

Available hardnesses: A, (B).

Size
Max. Width: 138 cm in plain, 138 cm in PS.
Thickness: 1.35 mm